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1. WO2021065280 - ORIGINAL PLATE FOR ON-PRESS DEVELOPMENT TYPE PRINTING, FABRICATION METHOD FOR PRINTING PLATE, AND STRUCTURE

Publication Number WO/2021/065280
Publication Date 08.04.2021
International Application No. PCT/JP2020/032788
International Filing Date 28.08.2020
IPC
B41N 1/14 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE OR CONSERVING THEM
1Printing plates or foils; Materials therefor
12non-metallic other than stone
14Lithographic printing foils
G03F 7/00 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F 7/004 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
G03F 7/027 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
G03F 7/033 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032with binders
033the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
G03F 7/09 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
09characterised by structural details, e.g. supports, auxiliary layers
Applicants
  • 富士フイルム株式会社 FUJIFILM CORPORATION [JP]/[JP]
Inventors
  • 渡邉 駿平 WATANABE Shumpei
  • 宮川 侑也 MIYAGAWA Yuuya
  • 西川 哲生 NISHIKAWA Tetsuo
Agents
  • 特許業務法人航栄特許事務所 KOH-EI PATENT FIRM, P.C.
Priority Data
2019-18034630.09.2019JP
2020-10731822.06.2020JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) ORIGINAL PLATE FOR ON-PRESS DEVELOPMENT TYPE PRINTING, FABRICATION METHOD FOR PRINTING PLATE, AND STRUCTURE
(FR) PLAQUE ORIGINALE POUR IMPRESSION DE TYPE DÉVELOPPEMENT SUR PRESSE, PROCÉDÉ DE FABRICATION DE PLAQUE D'IMPRESSION, ET STRUCTURE
(JA) 機上現像型印刷用原版、印刷版の作製方法、及び構造体
Abstract
(EN)
Provided are: an original plate which is for on-press development type printing and which prevents edges thereof from becoming dirty not only after production but also after a period of time has passed; and a method for fabricating a printing plate using the original plate for on-press development type printing. This original plate for on-press development type printing has at least one layer on an aluminum support having an anode oxidation film, wherein the layer contains a support-adsorptive anion having a formula weight of 1,000 or less, an interactive non-metal cation, and a polymer having a group that can interact with the interactive non-metal cation. This fabrication method for a printing plate uses the original plate for on-press development type printing.
(FR)
L'invention fournit une plaque originale pour impression de type développement sur presse dans laquelle la salissure des bords est empêchée, y compris après fabrication mais aussi après écoulement d'un certain temps, et fournit également un procédé de fabrication de plaque d'impression mettant en œuvre cette plaque originale pour impression de type développement sur presse. Plus précisément, l'invention concerne une plaque originale pour impression de type développement sur presse qui possède au moins une couche sur un corps de support en aluminium possédant un film de revêtement d'oxydation anodique. Ladite couche comprend un polymère qui possède un anion doté de propriétés d'adsorption par le corps de support et présentant une masse formulaire inférieure ou égale à 1000, un cation non-métallique interactif, et un groupe permettant une interaction avec ledit cation non-métallique interactif. L'invention concerne également un procédé de fabrication de plaque d'impression mettant en œuvre cette plaque originale pour impression de type développement sur presse.
(JA)
製造後のみならず経時後においてもエッジ汚れが防止された機上現像型印刷用原版、及び機上現像型印刷用原版を用いた印刷版の作製方法を提供する。 陽極酸化皮膜を有するアルミニウム支持体上に、少なくとも1つの層を有する機上現像型印刷用原版であって、上記層が、式量1,000以下の支持体吸着性アニオン、相互作用性非金属カチオン、及び上記相互作用性非金属カチオンと相互作用可能な基を有するポリマーを含有する機上現像型印刷用原版、並びに機上現像型印刷用原版を用いた印刷版の作製方法。
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