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1. WO2020153638 - PHOTOPOLYMER COMPOSITION

Publication Number WO/2020/153638
Publication Date 30.07.2020
International Application No. PCT/KR2020/000496
International Filing Date 10.01.2020
IPC
C08F 2/50 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2Processes of polymerisation
46Polymerisation initiated by wave energy or particle radiation
48by ultra-violet or visible light
50with sensitising agents
C08F 263/04 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
263Macromolecular compounds obtained by polymerising monomers on to polymers of esters of unsaturated alcohols with saturated acids as defined in group C08F18/177
02on to polymers of vinyl esters with monocarboxylic acids
04on to polymers of vinyl acetate
C08F 2/44 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2Processes of polymerisation
44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
C08L 31/04 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
31Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an acyloxy radical of a saturated carboxylic acid, of carbonic acid, or of a haloformic acid; Compositions of derivatives of such polymers
02Homopolymers or copolymers of esters of monocarboxylic acids
04Homopolymers or copolymers of vinyl acetate
C08K 5/02 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
KUSE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS
5Use of organic ingredients
02Halogenated hydrocarbons
C08K 5/521 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
KUSE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS
5Use of organic ingredients
49Phosphorus-containing compounds
51Phosphorus bound to oxygen
52bound to oxygen only
521Esters of phosphoric acids, e.g. of H3PO4
Applicants
  • 주식회사 엘지화학 LG CHEM, LTD. [KR]/[KR]
Inventors
  • 장석훈 JANG, Seokhoon
  • 김헌 KIM, Heon
  • 권세현 KWON, Se Hyun
  • 장영래 CHANG, Yeongrae
Agents
  • 유미특허법인 YOU ME PATENT AND LAW FIRM
Priority Data
10-2019-000998625.01.2019KR
Publication Language Korean (KO)
Filing Language Korean (KO)
Designated States
Title
(EN) PHOTOPOLYMER COMPOSITION
(FR) COMPOSITION PHOTOPOLYMÈRE
(KO) 포토폴리머 조성물
Abstract
(EN)
The present invention relates to: a photopolymer composition for forming a hologram, comprising a polymer matrix having a glass transition temperature of 80°C or lower or a precursor thereof, a photoreactive monomer, a low-refractive-index fluorine-based compound and a photoinitiator; a hologram recording medium manufactured from the photopolymer composition; an optical device comprising the hologram recording medium; and a hologram recording method using the hologram recording medium.
(FR)
La présente invention concerne : une composition photopolymère pour former un hologramme, comprenant une matrice polymère ayant une température de transition vitreuse de 80 °C ou moins ou un précurseur de celle-ci, un monomère photoréactif, un composé à base de fluor à faible indice de réfraction et un photoinitiateur ; un support d'enregistrement d'hologramme fabriqué à partir de la composition photopolymère ; un dispositif optique comprenant le support d'enregistrement d'hologramme ; et un procédé d'enregistrement d'hologramme utilisant le support d'enregistrement d'hologramme.
(KO)
본 발명은, 80℃이하의 유리 전이 온도를 갖는 고분자 매트릭스 또는 이의 전구체; 광반응성 단량체; 저굴절율 불소계 화합물; 및 광개시제;를 포함하는 홀로그램 형성용 포토폴리머 조성물과 상기 포토폴리머 조성물로부터 제조된 홀로그램 기록 매체와, 상기 홀로그램 기록 매체를 포함한 광학 소자와 상기 홀로그램 기록 매체을 이용한 홀로그래픽 기록 방법에 관한 것이다.
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