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1. WO2020151542 - LINER COOLING ASSEMBLY, REACTION CHAMBER, AND SEMICONDUCTOR PROCESSING APPARATUS

Publication Number WO/2020/151542
Publication Date 30.07.2020
International Application No. PCT/CN2020/072184
International Filing Date 15.01.2020
IPC
C23C 14/35 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
35by application of a magnetic field, e.g. magnetron sputtering
C23C 14/54 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
54Controlling or regulating the coating process
Applicants
  • 北京北方华创微电子装备有限公司 BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD. [CN]/[CN]
Inventors
  • 常青 CHANG, Qing
  • 李冰 LI, Bing
  • 边国栋 BIAN, Guodong
Agents
  • 北京天昊联合知识产权代理有限公司 TEE&HOWE INTELLECTUAL PROPERTY ATTORNEYS
Priority Data
201910062064.723.01.2019CN
201920110253.223.01.2019CN
Publication Language Chinese (ZH)
Filing Language Chinese (ZH)
Designated States
Title
(EN) LINER COOLING ASSEMBLY, REACTION CHAMBER, AND SEMICONDUCTOR PROCESSING APPARATUS
(FR) ENSEMBLE DE REFROIDISSEMENT DE CHEMISE, CHAMBRE DE RÉACTION ET APPAREIL DE TRAITEMENT DE SEMI-CONDUCTEURS
(ZH) 内衬冷却组件、反应腔室及半导体加工设备
Abstract
(EN)
A liner cooling assembly, comprising: an adapter (20), the adapter (20) being configured to fix a liner (12) inside a chamber, and being provided with a first surface (2011) and a second surface (2012) respectively facing an outer side face of the liner (12) and a bottom face of a bottom wall of the liner (12). A preset gap (204) is provided between the first surface (2011) and the outer side face of the liner (12), and the second surface (2012) is in contact with the bottom face of the bottom wall of the liner (12). In addition, a cooling channel (30) used to transfer a cooling medium is provided in the adapter (20) so as to cool the liner (12). Further provided are a reaction chamber and a semiconductor processing apparatus.
(FR)
L’invention concerne un ensemble de refroidissement de chemise, comprenant : un adaptateur (20), l'adaptateur (20) étant conçu pour fixer une chemise (12) à l'intérieur d'une chambre, et étant doté d'une première surface (2011) et d’une seconde surface (2012) faisant face respectivement à une face latérale externe de la chemise (12) et à une face inférieure d'une paroi inférieure de la chemise (12). Un espace prédéfini (204) est ménagé entre la première surface (2011) et la face latérale externe de la chemise (12), et la seconde surface (2012) est en contact avec la face inférieure de la paroi inférieure de la chemise (12). De plus, un canal de refroidissement (30) destiné à transférer un milieu de refroidissement est ménagé dans l'adaptateur (20) de façon à refroidir la chemise (12). L’invention porte en outre sur une chambre de réaction et sur un appareil de traitement de semi-conducteurs.
(ZH)
一种内衬冷却组件,包括:适配器(20),该适配器(20)被设置为将内衬(12)固定在腔室内,且适配器(20)具有分别与内衬(12)的外侧面和底壁底面相对的第一表面(2011)和第二表面(2012),其中,第一表面(2011)与内衬(12)的外侧面之间具有预设的间隙(204),第二表面(2012)与内衬(12)的底壁底面相接触;并且,适配器(20)中设置有用于传输冷却介质的冷却通道(30),用以对内衬(12)进行冷却。还公开了一种反应腔室及半导体加工设备。
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