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1. WO2020031379 - PHOTOSENSITIVE FILM, METHOD OF FORMING COLORED PATTERN, AND METHOD OF MANUFACTURING SUBSTRATE WITH COLORED PATTERN

Publication Number WO/2020/031379
Publication Date 13.02.2020
International Application No. PCT/JP2018/030115
International Filing Date 10.08.2018
IPC
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032
with binders
G03F 7/004 (2006.01)
G03F 7/032 (2006.01)
Applicants
  • 日立化成株式会社 HITACHI CHEMICAL COMPANY, LTD. [JP/JP]; 東京都千代田区丸の内一丁目9番2号 9-2, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1006606, JP
Inventors
  • 吉田 英樹 YOSHIDA Hideki; JP
  • 山崎 宏 YAMAZAKI Hiroshi; JP
  • 海老原 雅彦 EBIHARA Masahiko; JP
Agents
  • 長谷川 芳樹 HASEGAWA Yoshiki; JP
  • 清水 義憲 SHIMIZU Yoshinori; JP
  • 平野 裕之 HIRANO Hiroyuki; JP
Priority Data
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) PHOTOSENSITIVE FILM, METHOD OF FORMING COLORED PATTERN, AND METHOD OF MANUFACTURING SUBSTRATE WITH COLORED PATTERN
(FR) FILM PHOTOSENSIBLE, PROCÉDÉ DE FORMATION D'UN MOTIF COLORÉ, ET PROCÉDÉ DE FABRICATION DE SUBSTRAT AVEC MOTIF COLORÉ
(JA) 感光性フィルム、着色パターンの形成方法及び着色パターン付基材の製造方法
Abstract
(EN)
A photosensitive film comprising a support film and a photosensitive resin layer that is provided on the support film and is alkali developable, wherein the photosensitive resin layer includes a binder polymer, a photopolymerizable compound, a leuco dye, and a compound that generates acid when exposed to light or heat.
(FR)
Un film photosensible comprend un film de support et une couche de résine photosensible qui est disposée sur le film de support et est développable en milieu alcalin, la couche de résine photosensible comprenant un polymère liant, un composé photopolymérisable, un colorant leuco, et un composé qui génère de l'acide lorsqu'il est exposé à la lumière ou à la chaleur.
(JA)
本発明の感光性フィルムは、支持フィルムと、支持フィルム上に設けられたアルカリ現像可能な感光性樹脂層とを備え、感光性樹脂層が、バインダーポリマーと、光重合性化合物と、ロイコ染料と、光又は熱で酸を発生する化合物とを含有する。
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